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Ionpure® VNX55-Ultra Module for microelectronics

High-flow module, designed to produce high-purity water for the microelectronics industry

The VNX55-Ultra module with high flow capacity is designed using proven Ionpure® continuous electroionization (CEDI) technology to produce ultrapure water. The performance has been optimized to meet the constantly changing needs for contaminant removal in ultrapure water requirements from the microelectronics industry. The module's performance has been optimized to achieve boron levels at ppt-level with a single pass of EDI.


Each VNX55-Ultra industrial module has a nominal flow rate of 55 gpm (12,5 m³/h).


Multiple modules with 55 gpm provide a simplified system design with flow rates up to and over 1,000 gpm

Product information

Specifications
Value
Flow Rate, Maximum: m3/hr
15
Flow Rate, Minimum: m3/hr
9.5
Flow Rate, Maximum: gpm
66
Flow Rate, Minimum: gpm
42
Operating Temperature, Minimum: °F
68
Operating Temperature, Maximum: °F
113
Operating Temperature, Minimum: °C
20
Operating Temperature, Maximum: °C
45

Features & Benefits

  • No need for acid/caustic, neutralization systems or tank exchanges
  • Significantly lowers operating costs compared to conventional ion exchange
  • Guaranteed 18 MΩ-cm product resistivity, optimized for microelectronics and UPW systems
  • Silica and Boron removal of ≥ 99.8%
  • Sodium and chloride removal ≥ 99.9%
  • 95-97.5% recovery for high water savings
  • Robust leak-free sealing with through-port gasket
  • High flow module reduces system costs and simplifies skid design
  • Connection fittings are included
  • On-board junction box for DC power connections
  • 50mm butt weld natural polypropylene kits and drawings available

Model series

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